RTA Annealsys System
RTA System, Annealsys, AS-Micro Double Chamber
The RTA Annealsys System is a system designed for high-speed thermal processes known as Rapid Thermal Annealing (RTA). The annealing process involves heating a material (often semiconductor materials like silicon) to a very high temperature for a short period of time, followed by rapid cooling. This process is used to modify the material's properties, improve its quality, or repair defects.
RTA | Site
Edmond J. Safra (Givat-Ram)
Nano Center
Contacts
- Golan Tanami
- golant@savion.huji.ac.il