Plasma Asher Harrick
The Plasma Asher by Harrick is an advanced laboratory device designed for surface cleaning and modification using plasma technology. The device generates plasma from gases like oxygen or argon under low-pressure conditions, enabling the removal of contaminants, enhancement of adhesion, and alteration of material surface properties. It is widely used in fields such as microelectronics, microscopic analysis, and sample preparation for research. Its advantages include high precision, low-temperature operation, and environmentally friendly processes. Thanks to its compact size and ease of operation, the device is popular in academic research and advanced industries. It offers an efficient solution for processes requiring precise control over surface structure and properties.
Photos by Yoav Dudkevitch
Edmond J. Safra (Givat-Ram)
Nano Center
Contacts
- Golan Tanami
- golant@savion.huji.ac.il