Development Bench
The Development Bench is a critical workstation used for the chemical processing of substrates after lithographic exposure. It facilitates the controlled development of patterns by immersing or spraying the substrate with specialized chemicals that selectively remove exposed or unexposed areas, depending on the resist type. This bench is designed to maintain a clean and precise environment, ensuring high-quality pattern transfer. With adjustable parameters, it supports a wide range of development processes essential for fine-tuning microfabrication in industries like electronics and optics.
Edmond J. Safra (Givat-Ram)
Nano Center
Contacts
- Golan Tanami
- golant@savion.huji.ac.il