AJA Sputtering System
UHV Sputtering Layer Deposition
The AJA Sputtering System is a system designed for depositing thin films onto various substrates using a process called sputtering. This is a physical coating technique in which atoms or molecules from a target material are ejected by collisions with charged ions, and then deposited onto the target surface (the substrate).The AJA system focuses on precisely and carefully controlling the sputtering process, and is primarily used in fields such as materials science, semiconductor technology, the creation of thin layers in electronic materials, flat-panel display manufacturing, and other areas.
AJA | Site
Edmond J. Safra (Givat-Ram)
Nano Center
Contacts
- Amit Benbenishty
- amitbenbe@savion.huji.ac.il