Litho Table Hot Plate
The Litho Table Hot Plate is a specialized heating device used in photolithography, crucial for semiconductor and materials research. It provides precise temperature control, typically reaching up to 300°C, essential for various stages of photoresist application. With larger surface areas, these hot plates can accommodate multiple samples or larger wafers simultaneously. They offer excellent temperature uniformity, often within ±1°C, ensuring consistent results. Many models feature advanced temperature control systems with programmable ramps and profiles. Some include vacuum contact capabilities, enhancing sample adhesion and minimizing air gaps. The primary application involves the pre-baking and post-baking of photoresist layers for optimal adhesion. Overall, Litho Table Hot Plates are vital in both research and industrial settings, significantly advancing semiconductor technology.
Edmond J. Safra (Givat-Ram)
Nano Center
Contacts
- Golan Tanami
- golant@savion.huji.ac.il