E-beam development Bench
he E-beam Development Bench is a highly advanced tool used in precision fabrication. It employs electron beam lithography to create extremely fine patterns on substrates, achieving resolutions down to the nanometer scale. This equipment is critical for the development of complex electronic circuits, microdevices, and high-resolution components. By using a focused beam of electrons, it enables the direct writing of intricate designs with unmatched precision, offering flexibility in patterning that surpasses traditional lithographic methods. The E-beam bench is essential for research and development in fields requiring the highest level of detail and accuracy in fabrication processes.
Edmond J. Safra (Givat-Ram)
Nano Center
Contacts
- Golan Tanami
- golant@savion.huji.ac.il